Braintree, MA, United States of America

Chien-Fong Lo

USPTO Granted Patents = 2 

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2018-2020

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2 patents (USPTO):

Title: Innovations by Chien-Fong Lo in III-Nitride Structures

Introduction

Chien-Fong Lo is an accomplished inventor based in Braintree, MA (US). He has made significant contributions to the field of semiconductor technology, particularly in the growth of III-nitride structures. With a total of two patents to his name, Lo's work is recognized for its innovative approaches and practical applications.

Latest Patents

Lo's latest patents focus on nucleation layers for the growth of III-nitride structures. These patents describe methods for creating nucleation layers that can enhance the performance of semiconductors. A semiconductor can include a silicon substrate and a nucleation layer over the silicon substrate. The nucleation layer can consist of silicon and deep-level dopants. Additionally, the semiconductor can feature a III-nitride layer formed over the nucleation layer. Notably, at least one of the silicon substrate and the nucleation layer may contain ionized contaminants. Furthermore, the concentration of deep-level dopants is at least as high as the concentration of the ionized contaminants.

Career Highlights

Chien-Fong Lo is currently employed at IQE PLC, a company known for its expertise in semiconductor materials. His work at IQE PLC has allowed him to further develop his innovative ideas and contribute to advancements in the industry.

Collaborations

Lo has collaborated with notable colleagues, including Oleg Laboutin and Chen-Kai Kao. These collaborations have fostered a productive environment for innovation and have led to significant advancements in their respective fields.

Conclusion

Chien-Fong Lo's contributions to the field of semiconductor technology, particularly through his patents on III-nitride structures, highlight his role as a leading inventor. His work continues to influence the development of advanced semiconductor materials and technologies.

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