This inventor holds 1 USPTO granted patent. Top assignee: Advanced Ion Beam Technology, Inc.. Active years: 2020.
Company Filing History:
Years Active: 2020
Title: Chieh-Jen Yang: Innovator in Electrostatic Chuck Cleaning Technology
Introduction
Chieh-Jen Yang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of electrostatic chuck (ESC) technology. His innovative approach to cleaning ESCs has the potential to enhance the efficiency and reliability of semiconductor processes.
Latest Patents
Chieh-Jen Yang holds a patent for a "Method of cleaning electrostatic chuck." This method involves delivering an ion beam to the work surface of an ESC when no workpiece is held. The interaction between the ion beam and the depositions on the work surface effectively removes these depositions, regardless of whether the interaction is through physical bombardment or chemical reaction. This innovation ensures that the chucking force between the ESC and the held workpiece remains less affected by depositions formed during periods without a workpiece. The method allows for adjustments based on the characteristics of the depositions, such as structure, thickness, and material, as well as the ion beam parameters, including current, energy, and types of ions used.
Career Highlights
Chieh-Jen Yang is associated with Advanced Ion Beam Technology, Inc., where he continues to develop and refine technologies that improve semiconductor manufacturing processes. His work has been instrumental in advancing the capabilities of ESCs, which are critical components in the fabrication of integrated circuits.
Collaborations
Chieh-Jen Yang collaborates with talented professionals in his field, including Chun-Chin Kang and Yu-Ho Ni. Their combined expertise contributes to the innovative solutions being developed at Advanced Ion Beam Technology, Inc.
Conclusion
Chieh-Jen Yang's contributions to the field of electrostatic chuck cleaning technology exemplify the importance of innovation in semiconductor manufacturing. His patented method not only addresses existing challenges but also paves the way for future advancements in the industry.