This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2003.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2003
Title: Innovations by Chieh-Chung Wang in Wet Scrubbing Technology
Introduction
Chieh-Chung Wang, an inventive mind from Hsin-Chu Hsien, Taiwan, has made significant strides in the field of environmental technology. He is known for his innovative approach to designing a self-cleaning nozzle for wet scrubbers that addresses the common issue of clogging, thereby enhancing the efficiency of pollutant removal in various applications.
Latest Patents
Wang holds a notable patent titled "Self-Cleaning Nozzles of Wet Scrubber." This invention features a self-cleaning mechanism that incorporates an electromagnetic coil. When energized, this coil enlarges the outlet orifice of the nozzle, allowing clogged pollutant particles to fall through the orifice, thus unclogging it. The electromagnetic coil operates based on a signal that is responsive to increased pressure in the water supply pipe, which serves as an indicator of clogging.
Career Highlights
Chieh-Chung Wang works at Taiwan Semiconductor Manufacturing Company Limited (TSMC), where he contributes to innovative product development and engineering solutions. His work has been instrumental in improving wet scrubbing technologies, which are crucial for maintaining cleaner environments in semiconductor manufacturing processes.
Collaborations
Wang collaborates with Yi-Lang Ku, a fellow engineer and inventor. Together, they aim to push the boundaries of technology in their field, sharing insights and expertise to achieve groundbreaking results.
Conclusion
Chieh-Chung Wang exemplifies the spirit of innovation in the realm of environmental technology. His patented self-cleaning nozzle for wet scrubbers is a testament to his creativity and dedication to solving practical problems. As he continues his work at TSMC, Wang's contributions will undoubtedly lead to further advancements in the industry, fostering a cleaner and more efficient future.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile