Chieh Chih Ting

Title: Chieh Chih Ting: Innovator in Semiconductor Technology

Introduction

Chieh Chih Ting is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of methods for dopant implantation in MOS transistor devices. His innovative approach has implications for enhancing the performance and efficiency of semiconductor devices.

Latest Patents

Chieh Chih Ting holds a patent for a "Dopant implantation method using multi-step implants." This method involves forming a dopant implant region in a MOS transistor device with a specific dopant profile. The process includes implanting a first concentration of dopants into a substrate region, followed by at least one second implanting step to achieve the target dopant concentration without the need for substrate annealing.

Career Highlights

Chieh Chih Ting is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work focuses on advancing technologies that are critical for the production of high-performance semiconductor devices. His expertise and innovative methods contribute to the company's reputation for excellence in semiconductor manufacturing.

Collaborations

Chieh Chih Ting has collaborated with notable colleagues, including Tse-En Chang and Chih-Fu Chang. These collaborations have fostered an environment of innovation and have led to advancements in semiconductor technologies.

Conclusion

Chieh Chih Ting's contributions to semiconductor technology through his innovative patent and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as a key inventor in the field. His advancements in dopant implantation methods are paving the way for future developments in semiconductor devices.