This inventor holds 2 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2007-2011.
Company Filing History:
Years Active: 2007-2011
Title: Chiech-Yi Kuo: Innovator in Mask Fabrication Technology
Introduction
Chiech-Yi Kuo is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of mask fabrication technology, holding a total of 2 patents. His work focuses on improving the efficiency and accuracy of mask fabrication processes, which are crucial in semiconductor manufacturing.
Latest Patents
Chiech-Yi Kuo's latest patents include a method and system for mask fabrication process control. This innovative method utilizes statistical process control analysis to enhance the mask fabrication process. A manufacturing model is defined, and a process run of a mask is performed as per this model. A fault detection analysis is conducted to minimize bias in the manufacturing model, leading to the generation of a fine-tuning signal based on the analysis results. The process run operation is then adjusted according to this fine-tuning signal. Additionally, he has developed a mask fabrication system that comprises a processing tool, a metrology tool, and a controller. The processing tool is responsible for processing the mask, while the metrology tool inspects the mask to obtain inspection results. The controller generates and calibrates the manufacturing model based on device data, material data, and the inspection results.
Career Highlights
Chiech-Yi Kuo is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he applies his expertise in mask fabrication technology. His work has been instrumental in advancing the capabilities of semiconductor manufacturing processes.
Collaborations
Chiech-Yi Kuo collaborates with notable colleagues, including Yuh-Fong Hwang and Chen-Yu Chang. Their combined efforts contribute to the innovative advancements in the field of semiconductor technology.
Conclusion
Chiech-Yi Kuo's contributions to mask fabrication technology exemplify his commitment to innovation in the semiconductor industry. His patents and collaborative efforts continue to shape the future of manufacturing processes.