Saga, Japan

Chie Hide

This inventor holds 1 USPTO granted patent. Top assignee: Sumco Corporation. Active years: 2021.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Chie Hide: Innovator in Surface Analysis Technology

Introduction

Chie Hide is a notable inventor based in Saga, Japan. He has made significant contributions to the field of surface analysis technology, particularly through his innovative methods and devices.

Latest Patents

Chie Hide holds a patent for a "Method of preparing sample surface, method of analyzing sample surface, field-enhanced oxidation probe, and scanning probe microscope including field-enhanced oxidation probe." This patent describes a method for preparing a sample surface where a marking is formed. The marking consists of a local oxide film that is created by applying voltage between a probe and the sample surface while the probe's tip is in contact with the surface. The process is initiated after supplying moisture to the sample surface.

Career Highlights

Chie Hide is currently employed at Sumco Corporation, where he continues to develop and refine his innovative technologies. His work has been instrumental in advancing the capabilities of scanning probe microscopy.

Collaborations

Chie collaborates with talented colleagues, including Keiichiro Mori and Kaori Hashimoto, who contribute to the innovative environment at Sumco Corporation.

Conclusion

Chie Hide's contributions to surface analysis technology exemplify the impact of innovative thinking in scientific research. His patent and ongoing work at Sumco Corporation highlight the importance of advancements in this field.

Profile summary based on public USPTO records.
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