Chia-Yi Chiang

Title: Innovations of Chia-Yi Chiang in Integrated Circuit Technology

Introduction

Chia-Yi Chiang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of integrated circuit technology, particularly in etching methods that enhance the production of gate electrodes.

Latest Patents

Chia-Yi Chiang holds a patent for "Etching methods for integrated circuits." This innovative method focuses on etching a tungsten silicide (WSix) layer during the formation of a gate electrode in integrated circuits. The technique utilizes an etchant gas that comprises nitrogen gas (N) and oxygen gas (O) in a specified flow ratio. Additionally, the etchant gas may include chlorine gas (Cl) and tetrafluoromethane (CF). The selectivity of this etchant gas containing oxygen for WSix versus polysilicon is significantly higher, which reduces overetching and provides enhanced control in the production of gate electrodes.

Career Highlights

Chia-Yi Chiang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been pivotal in advancing the methods used in integrated circuit fabrication.

Collaborations

Chia-Yi has collaborated with esteemed colleagues such as Chien-Sheng Wu and Chih-Hsien Hsu, contributing to the innovative environment at his workplace.

Conclusion

Chia-Yi Chiang's contributions to integrated circuit technology through his patented etching methods demonstrate his expertise and commitment to innovation in the semiconductor field. His work continues to influence the development of advanced electronic devices.