Chia-Tsung Hung

Title: Chia-Tsung Hung: Innovator in Phase-Shifting Mask Technology

Introduction

Chia-Tsung Hung is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of photolithography through his innovative patent. His work focuses on enhancing the precision of line patterns in semiconductor manufacturing.

Latest Patents

Chia-Tsung Hung holds a patent for a "Chromeless phase-shifting mask for equal line/space dense line patterns." This invention presents a phase-shifting mask that is particularly suited for equal line/space, small pitched, dense line patterns. The mask comprises a transparent substrate, a partially shielded mesa line pattern of the first phase formed on the substrate, and a clear recessed line pattern of the second phase etched into the substrate. The design ensures that the partially shielded mesa line pattern features alternating 5%-10% transmittance light-shielding regions and clear regions. Notably, both the partially shielded mesa line pattern and the clear recessed line pattern maintain the same line width, resulting in a phase difference of 180 degrees between the light passing through the two patterns.

Career Highlights

Chia-Tsung Hung is currently employed at Nan Ya Technology Corporation, where he continues to innovate in the field of semiconductor technology. His work has been instrumental in advancing the capabilities of photolithography, which is crucial for the production of integrated circuits.

Collaborations

Chia-Tsung Hung collaborates with talented individuals such as Yuan-Hsun Wu and Yung-Long Hung. Their combined expertise contributes to the development of cutting-edge technologies in their field.

Conclusion

Chia-Tsung Hung's contributions to the field of photolithography through his innovative patent demonstrate his commitment to advancing technology. His work at Nan Ya Technology Corporation and collaborations with fellow inventors highlight the importance of teamwork in driving innovation.