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For the Inventor, By the Inventor

Hsinchu County, Taiwan

Chia-Sheng Fan

USPTO Granted Patents = 11 

Average Co-Inventor Count = 3.5

ph-index = 3

Forward Citations = 30(Granted Patents)


Location History:

  • Hsinchu County, TW (2018 - 2023)
  • Zhubei, TW (2019 - 2023)

Company Filing History:

goldMedal11 out of 40,635 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2018-2025

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11 patents (USPTO):Explore Patents
1. 12300696 - Semiconductor devices having fins and multiple isolation regions (2025-05-13),
2. 11798942 - Methods of manufacturing semiconductor devices having fins and an isolation region (2023-10-24),
3. 11742244 - Leakage reduction methods and structures thereof (2023-08-29),
4. 11043572 - Metal gate structure and methods thereof (2021-06-22),
5. 10991691 - Semiconductor device having fins and an isolation region (2021-04-27),
6. 10832958 - Leakage reduction methods and structures thereof (2020-11-10),
7. 10535746 - Metal gate structure and methods thereof (2020-01-14),
8. 10515957 - Semiconductor device having fins (2019-12-24),
9. 10354997 - Method for manufacturing semiconductor device with replacement gates (2019-07-16),
10. 10276445 - Leakage reduction methods and structures thereof (2019-04-30),
11. 10079289 - Metal gate structure and methods thereof (2018-09-18),

Title: Chia-Sheng Fan: Innovator in Semiconductor Technology

Introduction

Chia-Sheng Fan is a prominent inventor based in Hsinchu County, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 11 patents. His work focuses on advancing semiconductor devices, particularly those involving fins and isolation regions.

Latest Patents

Chia-Sheng Fan's latest patents include innovative methods for manufacturing semiconductor devices. One notable patent describes a semiconductor device and method that involves forming a first fin and a second fin on a substrate. The process includes creating a dummy gate material over the fins, forming a recess in the dummy gate material, and applying a sacrificial oxide on the sidewalls. The method further details filling an insulation material between the sacrificial oxide, removing the dummy gate material, and forming replacement gates over the fins. This approach enhances the performance and efficiency of semiconductor devices.

Career Highlights

Chia-Sheng Fan is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative approaches have positioned him as a key player in the development of advanced semiconductor technologies.

Collaborations

Chia-Sheng Fan has collaborated with notable colleagues, including Tung-Heng Hsieh and Bao-Ru Young. Their combined efforts contribute to the ongoing advancements in semiconductor research and development.

Conclusion

Chia-Sheng Fan's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the field. His work continues to shape the future of semiconductor devices, making significant strides in innovation.

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