Company Filing History:
Years Active: 2012
Title: Chia-Jung Liou: Innovator in Scattering Bar Rule Technology
Introduction: Chia-Jung Liou is a prominent inventor based in Taoyuan County, Taiwan. He has made significant contributions to the field of device fabrication through his innovative methods. His work focuses on enhancing the efficiency and accuracy of mask patterns used in manufacturing processes.
Latest Patents: Chia-Jung Liou holds 1 patent for a method titled "Method for establishing scattering bar rule." This patent describes a systematic approach to creating a scattering bar rule for mask patterns used in device fabrication. The method involves establishing an image simulation model based on the mask pattern and a process reference set. By applying various scattering bar reference sets to the model, multiple simulation images are generated. A selection process identifies candidate layouts, leading to the determination of a pattern layout and its corresponding scattering bar rule.
Career Highlights: Chia-Jung Liou is associated with Promos Technologies, Inc., where he applies his expertise in device fabrication technologies. His innovative approach has positioned him as a key figure in the development of advanced manufacturing techniques.
Collaborations: Chia-Jung Liou has worked alongside talented colleagues, including Chun-Yu Lin and Cheng-Hung Ku. Their collaborative efforts contribute to the advancement of technology in their field.
Conclusion: Chia-Jung Liou's contributions to the field of device fabrication through his innovative patent demonstrate his commitment to advancing technology. His work continues to influence the industry and inspire future innovations.