Company Filing History:
Years Active: 2021
Title: Chia-Hung Tai: Innovator in Silicon Carbide Technologies
Introduction
Chia-Hung Tai is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of materials science, particularly in the development of technologies related to silicon carbide crystals and ultra-thin graphite films. With a total of 2 patents, his work has garnered attention for its innovative approaches and practical applications.
Latest Patents
Chia-Hung Tai's latest patents include a preparation apparatus for silicon carbide crystals and a method for fabricating ultra-thin graphite films. The preparation apparatus comprises a circular cylinder, a doping tablet, and a plate designed to stabilize and control the supply of dopants. This invention allows for the growth of uniform silicon carbide crystals with consistent electrical characteristics. The second patent details a method for creating an ultra-thin graphite film on a silicon carbide substrate. This process involves several steps, including the use of a siloxane-coupling-group-containing polyamic acid solution and a carbonization process under an inert gas atmosphere, ultimately enabling the fabrication of high-quality graphite films at lower temperatures.
Career Highlights
Chia-Hung Tai is affiliated with the National Chung Shan Institute of Science and Technology, where he conducts research and development in advanced materials. His work has not only advanced the understanding of silicon carbide but has also opened new avenues for applications in electronics and other industries.
Collaborations
Chia-Hung Tai has collaborated with notable colleagues, including Dai-Liang Ma and Bang-Ying Yu. These partnerships have contributed to the success of his research and the development of innovative technologies.
Conclusion
Chia-Hung Tai's contributions to the field of materials science, particularly in silicon carbide technologies, highlight his role as a leading inventor. His patents reflect a commitment to innovation and excellence in research, paving the way for future advancements in the industry.