Chia-Hao Wang

Title: Inventor Profile – Chia-Hao Wang

Introduction

Chia-Hao Wang is a prominent inventor based in Hsinchu County, Taiwan, recognized for his contributions to the field of semiconductor technology. With an inventive mind and a passion for innovation, Wang has crafted solutions that address the challenges of modern electronic devices.

Latest Patents

Wang holds a patent titled "Self-aligned metal gate for multigate device and method of forming thereof." This invention involves devices and methods where a first gate structure wraps around a channel layer situated over a substrate, alongside a second gate structure that wraps around another channel layer. It also incorporates a dielectric fin structure created over a shallow trench isolation (STI) feature, positioned between the first and second gate structures. A significant feature of this patent is that at least one metallization layer is formed on the first gate structure, the dielectric fin structure, and the second gate structure, creating a seamless extension from the first gate structure to the second.

Career Highlights

Chia-Hao Wang is currently associated with Taiwan Semiconductor Manufacturing Company Limited, a leader in the semiconductor manufacturing industry. His work contributes significantly to advancements in multi-gate devices, which are essential for improving the efficiency and performance of electronic products.

Collaborations

Throughout his career, Wang has collaborated with fellow innovators and researchers, including Jia-Chuan You and Kuan-Ting Pan. These collaborations have likely fostered a creative environment, leading to further advancements and innovations within the field.

Conclusion

Chia-Hao Wang stands out as a key inventor in the semiconductor industry, with a focus on innovative gate structures that promise to enhance device performance. His continued contributions reflect a commitment to pushing the boundaries of technology and innovation, shaping the future of electronic devices.