Taoyuan, Taiwan

Chia Ching Ting

This inventor holds 1 USPTO granted patent and 1 published patent application and 2 EPO patents. Top assignee: Basf Se Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chia Ching Ting. Retrieved from https://idiyas.com/inventor/chia-ching-ting-n6j0cwpo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Chia Ching Ting: Innovator in Semiconductor Technology

Introduction: Chia Ching Ting is an inventor based in Taoyuan, Taiwan. He is currently employed at BASF SE Corporation, where he contributes to advancements in semiconductor technology. Although he has not yet been granted any patents, his work is significant in the field of semiconductor manufacturing.

Latest Patent Applications: Chia Ching Ting has submitted a patent application titled "COMPOSITION AND PROCESS FOR ELECTIVELY ETCHING A HARD MASK AND/OR AN ETCH-STOP LAYER IN THE PRESENCE OF LAYERS OF LOW-K MATERIALS, COPPER, COBALT AND/OR TUNGSTEN." This application describes a method that utilizes a cleaning composition in combination with one or more oxidants. The method is designed for removing post-etch or post-ash residue from the surface of a semiconductor substrate. It also includes a process for oxidative etching or partially oxidative etching of a layer or mask. The application outlines the cleaning composition and its use in removing residues, as well as a wet-etch composition that incorporates the cleaning composition and oxidants. Furthermore, it details a process for manufacturing a semiconductor device from a semiconductor substrate.

Conclusion: Chia Ching Ting is an emerging inventor in the semiconductor industry, with a focus on innovative cleaning compositions and etching processes. His contributions, although not yet reflected in granted patents, hold promise for future advancements in semiconductor technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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