Chia-Chen Chen

Title: The Innovative Contributions of Chia-Chen Chen

Introduction

Chia-Chen Chen is a notable inventor based in Fishkill, NY (US). She has made significant contributions to the field of technology, particularly in the area of photoresist materials and lithography techniques. Her work has led to advancements that are crucial for various applications in semiconductor manufacturing.

Latest Patents

Chia-Chen Chen holds a patent titled "Method of forming a pattern of an array of shapes including a blocked region." This innovative method involves the formation of a second photoresist with a specific photosensitivity on a substrate. A first photoresist, which has a greater photosensitivity, is then applied on top of the second. The first photoresist is designed to become transparent upon exposure, allowing for precise lithographic exposure using a first reticle. This process results in a composite pattern derived from the second pattern, effectively limiting it to the area of the transparent portions of the first photoresist.

Career Highlights

Throughout her career, Chia-Chen Chen has worked with prominent companies in the technology sector. She has been associated with IBM and Infineon Technologies, where she has contributed her expertise in developing advanced materials and processes for semiconductor applications.

Collaborations

Chia-Chen Chen has collaborated with esteemed colleagues, including Wu-Song S Huang and Wai-Kin Li. These partnerships have fostered innovation and have been instrumental in her research and development efforts.

Conclusion

Chia-Chen Chen's contributions to the field of technology and her innovative patent demonstrate her significant role as an inventor. Her work continues to influence advancements in semiconductor manufacturing and related technologies.