Basking Ridge, NJ, United States of America

Chi-Yuan Lo


Average Co-Inventor Count = 2.4

ph-index = 3

Forward Citations = 34(Granted Patents)


Company Filing History:


Years Active: 1993-2015

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5 patents (USPTO):Explore Patents

Title: Chi-Yuan Lo: Innovator in Integrated Circuit Design

Introduction

Chi-Yuan Lo is a prominent inventor based in Basking Ridge, NJ (US). He holds a total of 5 patents that contribute significantly to the field of integrated circuit (IC) design. His innovative approaches have paved the way for advancements in the accuracy and efficiency of IC technologies.

Latest Patents

One of Chi-Yuan Lo's latest patents is a method to adaptively calculate resistor mesh in IC designs. This method utilizes an adaptive square mesh for parasitic extraction, placing small squares of a predetermined minimum size in critical areas such as edges, contacts, vias, and corners. In less critical areas, a coarser grid with larger squares is employed to calculate parasitic values, allowing for more accurate results. Another notable patent involves extracting capacitance and resistance from FinFET devices. This invention provides a method for verifying an IC design by using a process description file that specifies the technology for building the IC. The method computes capacitance and resistance values based on the specific device type described in the process file.

Career Highlights

Chi-Yuan Lo has worked with notable companies such as Cadence Design Systems, Inc. and Lucent Technologies Inc. His experience in these organizations has allowed him to refine his skills and contribute to significant advancements in IC design.

Collaborations

Throughout his career, Chi-Yuan Lo has collaborated with esteemed colleagues, including Shun-Lin Su and Mikhail Khapaev. These collaborations have further enriched his work and led to innovative solutions in the field.

Conclusion

Chi-Yuan Lo's contributions to integrated circuit design through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the development of more efficient and accurate IC technologies.

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