Location History:
- Kyungki-do, KR (1997)
- Seoul, KR (2000)
Company Filing History:
Years Active: 1997-2000
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Title: Innovator Spotlight: Chi-won Chung - Revolutionizing Ferroelectric Capacitors
Introduction:
Chi-won Chung, a talented inventor based in Seoul, South Korea, has made significant contributions to the field of ferroelectric capacitors. With a total of 2 patents to his name, Chung is a visionary in developing cutting-edge technologies.
Latest Patents:
1. Method for Fabricating a Ferroelectric Capacitor: Chung's innovative method involves a multilayer structure that enhances fatigue behavior while reducing leakage current. By depositing specific layers over a silicon substrate, including silicon oxide, conductive oxide, and metal electrode layers, Chung has revolutionized ferroelectric capacitor design.
2. PZT Thin Films for Ferroelectric Capacitors: Chung's patented thin films consist of a unique combination of donor and acceptor dopants, increasing endurance and reducing coercive field. By excluding undesirable phases and utilizing materials like Pt as electrodes, Chung has improved the performance of PZT films significantly.
Career Highlights:
Chi-won Chung is a key figure at Samsung Electronics Co., Ltd., where he continues to innovate and drive advancements in ferroelectric technology. His expertise and dedication have led to groundbreaking developments in the industry.
Collaborations:
Chung has collaborated closely with esteemed colleagues such as In-kyung Yoo and Wan-in Lee. Together, they have pushed the boundaries of ferroelectric capacitor research, setting new standards for performance and reliability.
Conclusion:
In conclusion, Chi-won Chung's groundbreaking work in ferroelectric capacitors has solidified his reputation as a trailblazer in the field of technology. With a passion for innovation and a relentless pursuit of excellence, Chung continues to inspire and shape the future of electronic components.
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