Uiwang, South Korea

Chi Won An

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Cheil Industries Inc.. Active years: 2014-2015.

USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2014-2015

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2 patents (USPTO):Explore Patents

Title: Innovations by Chi Won An

Introduction

Chi Won An is a notable inventor based in Uiwang, South Korea. He has made significant contributions to the field of encapsulation materials, particularly in the development of resins used in electronic devices. With a total of 2 patents to his name, his work is recognized for its innovative approach and practical applications.

Latest Patents

Chi Won An's latest patents focus on a resin for transparent encapsulation material. This resin includes a first polysiloxane with hydrogen bound to silicon (Si—H) at its terminal end, and a second polysiloxane with an alkenyl group bound to silicon (Si-Vi) at its terminal end. The ratio of hydrogen bound to silicon (Si—H) in the first polysiloxane to the alkenyl group bound to silicon (Si-Vi) in the second polysiloxane is approximately 1 to 1. This innovative formulation enhances the performance and reliability of electronic devices.

Career Highlights

Chi Won An is currently employed at Cheil Industries Inc., where he continues to push the boundaries of material science. His work has been instrumental in advancing the technology behind encapsulation materials, which are crucial for protecting electronic components.

Collaborations

Some of his notable coworkers include Sung-Hwan Cha and Woo-Han Kim. Their collaborative efforts contribute to the innovative projects at Cheil Industries Inc.

Conclusion

Chi Won An's contributions to the field of encapsulation materials exemplify the spirit of innovation. His patents reflect a commitment to enhancing electronic device performance through advanced material science.

Profile summary based on public USPTO records.
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