Taipei, Taiwan

Chi-Wei Chao


Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Innovations in Thin Film Transistor Technology: The Contributions of Chi-Wei Chao

Introduction: Chi-Wei Chao is a notable inventor based in Taipei, Taiwan, recognized for his contributions to the field of thin film transistor (TFT) technology. With a focus on innovative methods that enhance the performance of electronic components, Chao holds a patent that exemplifies cutting-edge advancements in this area.

Latest Patents: Chi-Wei Chao's patent, titled "Method for forming thin film transistor," describes a novel approach to creating TFTs. The invention involves the use of metal electroless plating or chemical displacement processes to form metal clusters adjacent to the sidewall of the amorphous silicon active region pattern. This process allows for the crystallization of amorphous silicon during the metal-induced lateral crystallization (MILC) process, resulting in polysilicon with parallel grains. The unique angle at which the amorphous silicon crystallizes enhances the electron mobility across a specially designed tilt channel, ultimately improving the overall efficiency of the device.

Career Highlights: Chi-Wei Chao is associated with the Industrial Technology Research Institute, where he actively engages in research and development projects aimed at advancing semiconductor technologies. His endeavors have made a significant impact in improving the functionality and performance of electronic devices.

Collaborations: Throughout his career, Chao has collaborated with esteemed colleagues, including Guo-Ren Hu and Ying-Chia Chen. Their combined expertise contributes to the continuous exploration and enhancement of technological innovations in the semiconductor industry.

Conclusion: Chi-Wei Chao's inventive spirit and dedication to enhancing thin film transistor technology illustrate the vital role of inventors in driving progress within the electronics sector. His patented method not only addresses current challenges but also paves the way for future innovations in semiconductor applications.

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