Company Filing History:
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Years Active: 2013-2018
Title: Innovations of Chi-Te Liang
Introduction
Chi-Te Liang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on the development of advanced semiconductor devices and manufacturing methods.
Latest Patents
One of Chi-Te Liang's latest patents is a semiconductor device structure and method. This innovation involves a multi-layered semiconductor device and outlines a method of manufacture. In this embodiment, a first semiconductor layer, a first insulator layer, a second semiconductor layer, a second insulator layer, and a third semiconductor layer are formed over a substrate. A first transistor is created using the first semiconductor layer, the first insulator layer, and the second semiconductor layer. Additionally, a second transistor is formed using the second semiconductor layer, the second insulator layer, and the third semiconductor layer.
Career Highlights
Chi-Te Liang has worked with notable institutions, including National Taiwan University and Taiwan Semiconductor Manufacturing Company Ltd. His experience in these organizations has allowed him to refine his expertise in semiconductor technology and contribute to various innovative projects.
Collaborations
Chi-Te Liang has collaborated with several talented individuals in his field, including Minghwei Hong and Fan-Hung Liu. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies.
Conclusion
Chi-Te Liang's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the industry. His work continues to impact the field and inspire future innovations.