Chi-Shin Wang

Title: The Innovations of Chi-Shin Wang in Semiconductor Etching Processes

Introduction

Chi-Shin Wang, based in Hsinchu, Taiwan, is an innovative inventor recognized for his contributions to semiconductor manufacturing. With a patent to his name, Wang's work focuses on improving etching processes, specifically aimed at enhancing the efficiency and precision in the semiconductor fabrication industry.

Latest Patents

Wang's notable patent addresses the method of oxidation to mitigate dry etch and/or wet etch fluorine residue. In this invention, fluorine is oxidized after the dry etching of an oxide layer situated above a source/drain contact and prior to the cleaning process. This method significantly reduces the formation of hydrofluoric acid during cleaning, which can otherwise lead to unexpected wet etching of the source/drain contact. His innovation allows for the creation of a recess in the source/drain contact with a depth to width ratio ranging from approximately 1.0 to 1.4, effectively preventing damage to the silicide layer beneath the source/drain resulting from excessive hydrofluoric acid exposure.

Additionally, his patent describes forming the recess using multiple wet etch processes. By oxidizing any residual fluorine between these processes, the duration and corrosiveness of each wet etch can be minimized, enabling greater control over the recess dimensions. Furthermore, the reduction of hydrofluoric acid during cleaning between these wet etch processes decreases the risk of etching the source/drain contact inadvertently.

Career Highlights

Chi-Shin Wang is affiliated with Taiwan Semiconductor Manufacturing Company Limited, a leader in the semiconductor industry. His research and inventive work contribute significantly to the advancement of semiconductor technologies, enhancing the quality and reliability of semiconductor devices in various applications.

Collaborations

Throughout his career, Wang collaborates with esteemed colleagues such as U-Ting Chiu and Chun-Cheng Chou. These partnerships foster a dynamic environment for innovation, driving new research and development projects that propel the semiconductor industry forward.

Conclusion

Chi-Shin Wang exemplifies the spirit of innovation within the realm of semiconductor manufacturing. His patented methods for improving etching processes not only exemplify creativity but also contribute to the efficiency and precision required in modern technology. As the semiconductor landscape continues to evolve, inventors like Wang play a critical role in shaping its future.