Company Filing History:
Years Active: 1999
Title: Innovations of Chi-Shiang Lee
Introduction
Chi-Shiang Lee is a notable inventor based in Hua-Lien, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of flash EEPROM devices. His innovative approach has led to advancements that enhance the performance and endurance of these devices.
Latest Patents
Chi-Shiang Lee holds a patent for a method aimed at improving the endurance of split gate flash EEPROM devices. This patent describes a process for fabricating a flash EEPROM device that incorporates a shallow, heavily doped, source side region. This innovative process features the placement of a shallow, ion implanted arsenic region in the semiconductor substrate, adjacent to one side of a floating gate structure, prior to the creation of the control gate structure. The introduction of this shallow, ion implanted arsenic region significantly improves the coupling ratio at the source. As a result, the flash EEPROM device can sustain approximately 1,000,000 program/erase cycles, compared to only 400,000 program/erase cycles for devices fabricated without this enhancement.
Career Highlights
Chi-Shiang Lee is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to innovate and contribute to the field of semiconductor manufacturing. His work has been instrumental in pushing the boundaries of what is possible in flash memory technology.
Collaborations
Throughout his career, Chi-Shiang Lee has collaborated with esteemed colleagues, including An-Min Chiang and Long-Shang Juang. These collaborations have fostered an environment of innovation and have led to the successful development of advanced technologies in the semiconductor industry.
Conclusion
Chi-Shiang Lee's contributions to the field of semiconductor technology, particularly through his patent for enhancing flash EEPROM devices, demonstrate his commitment to innovation. His work not only improves device performance but also sets a new standard for endurance in the industry.