Chi-Sheng Chen

Title: The Innovative Contributions of Chi-Sheng Chen

Introduction

Chi-Sheng Chen is a prominent inventor based in New Taipei, Taiwan, renowned for his innovative contributions to the field of material science. With a focus on enhancing semiconductor manufacturing processes, his work exemplifies the intersection of chemistry and technology.

Latest Patents

Chi-Sheng Chen holds a patent titled "Method for Removing Nitride Material." This patent outlines a strategic approach to efficiently remove silicon nitride material from substrates used in semiconductor manufacturing. The method includes several key steps, beginning with providing a substrate that has a gate structure formed on it, followed by the formation of a silicon nitride hard mask on the gate structure. The process involves two stages of removal using phosphoric acid solutions, with the first removal targeting a portion of the silicon nitride hard mask and the second focusing on the remnants. Notably, both removal steps are performed in-situ, ensuring an efficient and controlled process, with the second phosphoric acid solution applied at a lower temperature than the first.

Career Highlights

Chi-Sheng Chen is associated with United Microelectronics Corp., a leading entity in the semiconductor industry. His work here reflects a commitment to innovation and improving manufacturing techniques, which are crucial as the industry continues to advance rapidly. His singular patent showcases his ability to address significant challenges in semiconductor fabrication, propelling the company toward greater technological achievements.

Collaborations

Throughout his career, Chi-Sheng Chen has collaborated with notable colleagues, including Shin-Chi Chen and Chih-Yueh Li. These partnerships have allowed for the exchange of ideas and expertise, further enhancing the inventive process behind their collective work in the semiconductor field.

Conclusion

Chi-Sheng Chen exemplifies the spirit of innovation within the semiconductor industry. His contributions, particularly through his patented method for removing nitride material, demonstrate his role in advancing manufacturing efficiency and effectiveness. As technology continues to evolve, inventors like Chi-Sheng Chen will remain pivotal in shaping the future of semiconductor fabrication.