Hsinchu, Taiwan

Chi-Shen Tuan

This inventor holds 4 USPTO granted patents and 2 published patent applications. Top assignee: Industrial Technology Research Institute. Active years: 1995-2014.

USPTO Granted Patents = 4 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 25(Granted Patents)


Location History:

  • Taipei, TW (1995)
  • Hsinchu, TW (2005 - 2006)
  • Zhubei, TW (2014)

Company Filing History:


Years Active: 1995-2014

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4 patents (USPTO):Explore Patents

Title: Innovations of Chi-Shen Tuan

Introduction

Chi-Shen Tuan is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of materials science, particularly in the development of functionalized compounds and methods to enhance the stability of photoelectric devices. With a total of 4 patents, Tuan's work has implications for various applications in technology and industry.

Latest Patents

One of Tuan's latest patents is focused on a functionalized soybean compound and a coating composition employing the same. This innovation provides a functionalized soybean compound with a specific chemical structure, which can be utilized in various applications. Another significant patent involves a method of reducing photoelectric device leakage current in conjugated polymers. This method addresses the issue of leakage current caused by residual metal ions, enhancing the stability and performance of photoelectric devices.

Career Highlights

Chi-Shen Tuan is affiliated with the Industrial Technology Research Institute, where he conducts research and development in advanced materials. His work has been instrumental in pushing the boundaries of technology, particularly in the realm of photoelectric devices and functional materials.

Collaborations

Tuan has collaborated with notable colleagues such as Shinn-Jen Chang and Po-Ling Shiao. These collaborations have further enriched his research and contributed to the advancements in his field.

Conclusion

Chi-Shen Tuan's innovative work and patents reflect his commitment to advancing technology and materials science. His contributions are paving the way for future developments in the industry.

Profile summary based on public USPTO records.
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