This inventor holds 1 USPTO granted patent. Top assignee: Nan Ya Plastics Corporation. Active years: 2004.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2004
Title: Chi-Ming Chang: Innovator in Photosensitive Ink Composition
Introduction
Chi-Ming Chang is a notable inventor based in Taiwan, recognized for his contributions to the field of photosensitive materials. He has developed innovative solutions that enhance the performance and application of resistive inks in various industries.
Latest Patents
Chi-Ming Chang holds a patent for a novel photosensitive ink composition. This composition includes a photo-curable prepolymer, a photocurable monomer, a photo-initiator, organic solvents, an epoxy compound, a curing agent, and a clay nano-composite. The resulting ink composition is designed to produce a solder mask film with excellent properties such as adhesiveness, chemical resistance, heat resistance, and high resolution.
Career Highlights
Chi-Ming Chang is associated with Nan Ya Plastics Corporation, where he applies his expertise in developing advanced materials. His work has significantly contributed to the company's reputation in the field of innovative materials.
Collaborations
Chi-Ming Chang has collaborated with esteemed colleagues, including Hsiao-Loung Lu and Chun-Che Tsao, to further enhance the development of photosensitive materials.
Conclusion
Chi-Ming Chang's innovative work in photosensitive ink composition exemplifies the importance of research and development in advancing material science. His contributions continue to impact various applications in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile