Company Filing History:
1 out of 7,085 
1 out of 351 Years Active: 2019
Title: Innovations of Chi-Lune Huang: A Pioneer in Planarization Methods
Introduction: Chi-Lune Huang, based in Tainan, Taiwan, is an accomplished inventor recognized for his innovation in the field of semiconductor fabrication. His contributions have gained traction in the industry, primarily through his patent which addresses core challenges in the manufacturing process of semiconductor devices.
Latest Patents: Chi-Lune Huang holds a notable patent for a planarization method designed to improve the production of semiconductor structures. This method includes several key processes: first, a substrate is provided with a semiconductor structure, followed by the formation of a dielectric layer atop it. A mask layer is then applied to the dielectric layer before performing a chemical mechanical polishing process. This process creates an opening directly above the semiconductor structure, exposing the dielectric layer beneath. The subsequent etching process removes selective portions of the dielectric layer, leading to improved efficiency and precision in semiconductor production. After removing the mask layer, a second chemical mechanical polishing process is executed to finalize the planarization.
Career Highlights: Throughout his career, Chi-Lune Huang has made significant contributions while working with leading companies in the semiconductor industry. He has been associated with notable organizations such as United Microelectronics Corporation and Fujian Jinhua Integrated Circuit Co., Ltd. His innovations have not only advanced the technology but also positioned him as a key player in the evolution of semiconductor manufacturing methods.
Collaborations: Chi-Lune Huang has collaborated with esteemed professionals in his field, including Jen-Chieh Lin and Lee-Yuan Chen. These collaborations have fostered an environment of creativity and innovation, allowing for enhanced research and development within the semiconductor landscape.
Conclusion: Chi-Lune Huang's inventive contributions, particularly in the area of planarization methods, represent a significant advancement in semiconductor technology. His work reflects the essence of innovation, paving the way for future developments in the industry. As the semiconductor market continues to evolve, the impact of his inventions is sure to resonate, benefitting companies and the sector as a whole.