Chi-Hua Fu

Title: The Innovations of Chi-Hua Fu

Introduction

Chi-Hua Fu is a prominent inventor based in Hsinchu County, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patents. With a total of four patents to his name, Fu has established himself as a key figure in the industry.

Latest Patents

One of Chi-Hua Fu's latest patents is focused on an extreme ultraviolet (EUV) mask and the method of manufacturing the same. This EUV mask features a multilayer Mo/Si stack that comprises alternating molybdenum (Mo) and silicon (Si) layers, which are disposed over a first major surface of a mask substrate. Additionally, it includes a capping layer made of ruthenium (Ru) placed over the multilayer Mo/Si stack, along with an absorber layer on the capping layer. The design incorporates a circuit pattern area and a particle attractive area, with the capping layer being exposed at the bottoms of patterns in the particle attractive area. This innovative approach enhances the performance and reliability of semiconductor manufacturing processes.

Career Highlights

Chi-Hua Fu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading organization in the semiconductor industry. His work has been instrumental in advancing the technology used in semiconductor fabrication, contributing to the company's reputation for excellence.

Collaborations

Fu has collaborated with notable colleagues, including Chih-Tsung Shih and Tsung-Chih Chien. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Chi-Hua Fu's contributions to the field of semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the industry positively, paving the way for future advancements in semiconductor manufacturing.