Company Filing History:
Years Active: 2002-2005
Title: Innovations of Chi-Feng Cheng
Introduction
Chi-Feng Cheng is a notable inventor based in Yuan-Lin Cheng, Taiwan. He has made significant contributions to the field of chemical mechanical polishing, with a focus on improving the efficiency and effectiveness of slurry monitoring systems. With a total of 3 patents to his name, Cheng continues to push the boundaries of innovation in his field.
Latest Patents
One of his latest patents is a "System for monitoring oxidant concentration of slurry in a chemical mechanical polishing process." This system includes a spectrometer and a central controller. The spectrometer is coupled to a conduit for supplying slurry between a slurry supply tub and a polishing table. It is designed to detect the oxidant concentration of the slurry. The central controller is connected to the spectrometer, the slurry supply tub, and the polishing table. It adjusts the composition of the slurry in the supply tub and the polishing conditions based on the oxidant concentration detected by the spectrometer.
Another significant patent is the "Wafer carrier structure for chemical-mechanical polisher." This invention features a wafer carrier structure that includes a holder and a slurry supply pipeline. The pipeline is attached to the side of the holder, allowing for optimal slurry distribution during the polishing process.
Career Highlights
Chi-Feng Cheng is currently employed at Macronix International Co., Ltd., where he applies his expertise in chemical mechanical polishing technologies. His work has been instrumental in advancing the capabilities of polishing devices used in semiconductor manufacturing.
Collaborations
Cheng collaborates with various professionals in his field, including his coworker Cheng-Chen Calvin Hsueh. Their combined efforts contribute to the ongoing development of innovative solutions in chemical mechanical polishing.
Conclusion
Chi-Feng Cheng's contributions to the field of chemical mechanical polishing through his patents and work at Macronix International Co., Ltd. highlight his role as a key innovator. His inventions continue to enhance the efficiency of polishing processes in the semiconductor industry.