Chezheng Cao

Title: Chezheng Cao: Innovator in Substrate Processing Technology

Introduction

Chezheng Cao is a notable inventor based in Beaverton, OR (US). He has made significant contributions to the field of substrate processing technology. His innovative approach has led to the development of a unique method for residue removal from substrates.

Latest Patents

Cao holds a patent for an invention titled "In-situ back side plasma treatment for residue removal from substrates." This method involves processing a substrate by loading it onto a plurality of lift pins that pass through a pedestal arranged in a processing chamber. The lift pins are lowered to rest the substrate on the pedestal. A deposition gas mixture is supplied to deposit a film on the substrate. Once the supply of the deposition gas mixture is stopped, the substrate is raised above the pedestal using the lift pins. An etch gas mixture is then supplied, and plasma is struck in the processing chamber between the substrate and the surface of the pedestal to effectively remove any residual film.

Career Highlights

Cao is currently employed at Lam Research Corporation, where he continues to advance his research and development efforts. His work has been instrumental in enhancing substrate processing techniques, which are crucial in various manufacturing processes.

Collaborations

Cao collaborates with talented individuals in his field, including coworkers Tu Hong and Chunhai Ji. Their combined expertise fosters an environment of innovation and progress within their projects.

Conclusion

Chezheng Cao's contributions to substrate processing technology exemplify the impact of innovative thinking in the field of engineering. His patent and ongoing work at Lam Research Corporation highlight his commitment to advancing technology and improving manufacturing processes.