The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 2026
Filed:
Sep. 15, 2022
Lam Research Corporation, Fremont, CA (US);
Tu Hong, Tualatin, OR (US);
Chezheng Cao, Beaverton, OR (US);
Chunhai Ji, Portland, OR (US);
Ming Li, West Linn, OR (US);
LAM RESEARCH CORPORATION, Fremont, CA (US);
Abstract
A method for processing a substrate loading the substrate onto a plurality of lift pins passing through a pedestal arranged in a processing chamber. The plurality of lift pins are lowered to rest the substrate on the pedestal. A deposition gas mixture is supplied to deposit film on the substrate. The supply of the deposition gas mixture is stopped. The substrate is raised above the pedestal in the processing chamber using the plurality of lift pins. An etch gas mixture is supplied. Plasma is struck in the processing chamber between the substrate and the surface of the pedestal to remove residual film.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile