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Title: Cheuk Wun Wong: Innovator in Interference Pattern Measurement
Introduction
Cheuk Wun Wong is a notable inventor based in Malta, NY (US). He has made significant contributions to the field of measurement technology, particularly in the area of interference pattern overlay measurement. With a total of 4 patents to his name, Wong's work has advanced the precision and accuracy of measurement techniques.
Latest Patents
Wong's latest patents focus on self-referencing and self-calibrating interference pattern overlay measurement. This innovative approach involves forming two pairs of alignment targets on different masks to create conjugated interference patterns. By analyzing the misalignment of dark and light regions in these patterns, Wong's method calculates a magnification factor that allows for precise determination of target misalignment. This self-referenced and self-calibrated measurement technique enhances the reliability of alignment in various applications.
Career Highlights
Throughout his career, Cheuk Wun Wong has worked with prominent companies in the technology sector. Notably, he has been associated with GlobalFoundries Inc. and Kla Corporation. His experience in these organizations has contributed to his expertise in measurement technologies and innovation.
Collaborations
Wong has collaborated with several talented individuals in his field, including Dongyue Yang and Xintuo Dai. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in technology.
Conclusion
Cheuk Wun Wong's contributions to interference pattern measurement demonstrate his innovative spirit and dedication to advancing technology. His patents and collaborations reflect a commitment to precision and accuracy in measurement techniques.