Cheuk Ming Lee

Title: Cheuk Ming Lee: Innovator in Lithography Technology

Introduction

Cheuk Ming Lee is a notable inventor based in Castro Valley, CA (US), recognized for his contributions to lithography technology. With a total of 5 patents, he has made significant advancements in methods and systems that enhance the efficiency of substrate processing.

Latest Patents

One of his latest patents is titled "Method for fast loading substrates in a flat panel tool." This invention relates to a method and apparatus for loading, processing, and unloading substrates. The processing system includes a load/unload system connected to a photolithography system. This system features two sets of tracks with different heights and widths, allowing for the efficient transfer of unprocessed and processed substrates.

Another significant patent is "Dynamic cooling control for thermal stabilization for lithography system." This invention provides a system and methods that reduce stabilization time and improve the exposure pattern writing process in photoresist on substrates. The system includes a slab, a stage, a processing apparatus, and a chiller system, all designed to enhance the lithography process.

Career Highlights

Cheuk Ming Lee has worked with prominent companies in the field, including Applied Materials, Inc. and Ulvac, Inc. His experience in these organizations has contributed to his expertise in lithography and substrate processing technologies.

Collaborations

Throughout his career, Cheuk Ming Lee has collaborated with talented individuals such as Benjamin M Johnston and Jae Myung Yoo, who have contributed to his innovative projects.

Conclusion

Cheuk Ming Lee's work in lithography technology showcases his innovative spirit and dedication to advancing substrate processing methods. His patents reflect a commitment to improving efficiency and effectiveness in the field, making him a significant figure in the world of inventions.