Applied Materials, Inc.

Ulvac, Inc.

Cheuk Ming Lee

Benjamin M Johnston

Jae Myung Yoo

Antoine P Manens

Preston Fung

David Michael Corriveau

WeiMin Tao

Sean Screws

Ben John Sy

Paul Argus Parks

David Albertalli

Robert F Taff

Roy M Patterson

Robert D Taff

The present disclosure generally relates to a method and apparatus for loading, processing, and unloading substrates. A processing system comprises a load/unload system coupled to a photolithography system. The load/unload system comprises a first set of tracks having a first height and a first width, and a second set of tracks having a second height and a second width different than the first height and first width. An unprocessed substrate is transferred from a lift pin loader to a chuck along the first set of tracks on a first tray while a processed substrate is transferred from the chuck to the lift pin loader along the second set of tracks on a second tray. While a first tray remains with a substrate on the chuck during processing, the load/unload system is configured to unload a processed substrate and load an unprocessed substrate on a second tray.

Method for fast loading substrates in a flat panel tool

Embodiments described herein provide a system, a software application, and methods of a lithography process that provide at least one of the ability to decrease the stabilization time and write an exposure pattern into a photoresist on a substrate compensating for the change in the total pitch over a stabilization time. One embodiment of the system includes a slab, a stage disposed over the slab, a pair of supports disposed on the slab, a processing apparatus, and a chiller system. The pair of supports support a pair of tracks and the stage is configured to move along the pair of tracks. The processing apparatus has an apparatus support coupled to the slab and a processing unit supported by the apparatus support. The processing unit has a plurality of image projection systems. The chiller system has at least one fluid channel disposed in each track of the pair of tracks.

Dynamic cooling control for thermal stabilization for lithography system

According to the present disclosure, a printer apparatus may include a chuck configured to support a substrate thereon, a rail spaced apart from the chuck, a printhead carriage frame coupled to the rail, and a printhead carriage pivotally coupled to the printhead carriage frame.

Rotatable printhead array

Growing community of inventors

Castro Valley, CA, United States of America

Cheuk Ming Lee