This inventor holds 1 USPTO granted patent. Top assignee: Chartered Semiconductor Manufacturing Ltd (Corporation). Active years: 2004.
Company Filing History:
Years Active: 2004
Title: Chester Nieh: Innovator in CMOS Device Fabrication
Introduction
Chester Nieh is a notable inventor based in Singapore, recognized for his contributions to the field of semiconductor technology. He has developed innovative methods that enhance the fabrication processes of CMOS devices, showcasing his expertise and creativity in the industry.
Latest Patents
Chester Nieh holds a patent for a method of self-aligning a damascene gate structure to isolation regions. This process allows for the fabrication of a CMOS device where conductive gate structures are defined in a self-aligned manner to shallow trench isolation (STI) regions, eliminating the need for photolithographic procedures. The method involves defining shallow trench openings in semiconductor substrate regions that are not covered by dummy gate structures or silicon oxide spacers. The process includes filling these openings with silicon oxide and removing the dummy gate structures, resulting in STI regions that consist of filled shallow trench openings, overlying silicon oxide shapes, and silicon oxide sidewall spacers. The formation of silicon nitride spacers on the sides of the STI regions is followed by the deposition of a high-k gate insulator layer and a conductive gate structure, which is formed self-aligned to the STI regions.
Career Highlights
Chester Nieh is currently employed at Chartered Semiconductor Manufacturing Ltd, where he continues to innovate in semiconductor fabrication techniques. His work has significantly impacted the efficiency and effectiveness of CMOS device manufacturing.
Collaborations
Chester has collaborated with notable colleagues, including Daniel Yen and Ching-Thiam Chung, contributing to advancements in semiconductor technology through teamwork and shared expertise.
Conclusion
Chester Nieh's innovative approach to CMOS device fabrication has led to significant advancements in the semiconductor industry. His patent and contributions reflect his dedication to improving manufacturing processes and technology.