Cheryl B Field

Title: Cheryl B Field: Innovator in Semiconductor Technology

Introduction

Cheryl B Field is a notable inventor based in Granite Springs, NY (US). She has made significant contributions to the field of semiconductor technology, particularly through her innovative methods that enhance the fabrication process.

Latest Patents

Cheryl holds 1 patent for her invention titled "Method for forming narrow images on semiconductor substrates." This method provides a technique for achieving very narrow resolvable line widths on a semiconductor substrate surface. The process involves initial overexposure of a positive working photoresist through a mask, which allows for the exposure of both the transparent areas and the outer periphery of the opaque areas of the mask. Subsequent processing makes the areas of the substrate surface corresponding to the originally unexposed areas of the photoresist available for semiconductor fabrication, such as creating narrow electrical isolation areas.

Career Highlights

Cheryl has had a distinguished career at International Business Machines Corporation (IBM), where she has applied her expertise in semiconductor technology. Her work has been instrumental in advancing the capabilities of semiconductor fabrication processes.

Collaborations

Cheryl has collaborated with various professionals in her field, including her coworker Russell C Lange. Their combined efforts have contributed to the development of innovative solutions in semiconductor technology.

Conclusion

Cheryl B Field's contributions to semiconductor technology through her patent and work at IBM highlight her role as a key innovator in the industry. Her methods continue to influence the field and pave the way for future advancements.