Singapore, Singapore

Cher Sian Chua

This inventor holds 1 USPTO granted patent. Top assignee: Chartered Semiconductor Manufacturing Ltd (Corporation). Active years: 2007.


% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: Cher Sian Chua: Innovator in Semiconductor Technology

Introduction

Cher Sian Chua is a notable inventor based in Singapore, recognized for her contributions to semiconductor technology. With a focus on improving the efficiency and reliability of semiconductor devices, she has developed innovative methods that address critical challenges in the field.

Latest Patents

Cher Sian Chua holds a patent titled "Methods for elimination of arsenic based defects in semiconductor devices with isolation regions." This invention outlines methods for preparing conductive regions, such as source/drain regions, for silicidation procedures. The methods emphasize the removal of native oxide and arsenic-based defects from conductive surfaces before the deposition of metal components in metal silicide regions. The patent also details a hydrofluoric acid cycle that aids in releasing arsenic from shallow trench isolation regions, preventing re-deposition on source/drain regions. The techniques include wet etch procedures using hydrofluoric acid and hydrogen peroxide, along with spin dry and dry etch procedures to eliminate re-deposited arsenic defects.

Career Highlights

Cher Sian Chua is currently employed at Chartered Semiconductor Manufacturing Ltd, a prominent corporation in the semiconductor industry. Her work has significantly impacted the development of reliable semiconductor devices, showcasing her expertise and innovative approach.

Collaborations

Cher has collaborated with notable colleagues, including Vincent Sih and Ping Yu Ee, who have contributed to her research and development efforts in semiconductor technology.

Conclusion

Cher Sian Chua's innovative methods for eliminating arsenic-based defects in semiconductor devices highlight her significant contributions to the field. Her work continues to influence advancements in semiconductor technology, ensuring greater efficiency and reliability in electronic devices.

Profile summary based on public USPTO records.
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