Cheolmo Yang

Title: Cheolmo Yang: Innovator in Semiconductor Technology

Introduction

Cheolmo Yang is a prominent inventor based in Yongin-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on developing compositions and methods that enhance the manufacturing processes of semiconductor devices and packages.

Latest Patents

Yang's latest patents include innovative compositions for removing photoresists and methods for manufacturing semiconductor devices and packages using these compositions. The photoresist-removing composition consists of a polar organic solvent, an alkyl ammonium hydroxide, an aliphatic amine that does not include a hydroxy group, and a monovalent alcohol. In the manufacturing process of a semiconductor device, a photoresist pattern is formed on a substrate, followed by the application of the photoresist-removing composition to the pattern. For semiconductor packages, a photoresist pattern with multiple via holes is created on a substrate, where conductive posts made of metal are formed inside these holes. The photoresist pattern is then removed using the innovative composition, allowing for the adhesion of a semiconductor chip to the substrate between the conductive posts.

Career Highlights

Throughout his career, Cheolmo Yang has worked with leading companies in the industry, including Samsung Electronics Co., Ltd. and Kpx Chemical Co., Ltd. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

Yang has collaborated with notable colleagues such as Hyojin Yun and Seungwon Kim, further enhancing his contributions to the field.

Conclusion

Cheolmo Yang's work in semiconductor technology exemplifies innovation and dedication to advancing manufacturing processes. His patents reflect a commitment to improving the efficiency and effectiveness of semiconductor devices and packages.