Suwon, South Korea

Cheolhee Cho

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Cheolhee Cho. Retrieved from https://idiyas.com/inventor/cheolhee-cho

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations by Cheolhee Cho in Surface Treatment of Aluminum Materials

Introduction

Cheolhee Cho is an accomplished inventor based in Suwon, South Korea. He has made significant contributions to the field of materials science, particularly in the treatment of aluminum surfaces. His innovative methods have the potential to enhance the durability and aesthetic appeal of aluminum products.

Latest Patents

Cheolhee Cho holds a patent for a surface treatment method of aluminum material. This method involves several steps, including degreasing the aluminum material, etching, and performing a two-step desmutting treatment using nitric acid solutions. The process culminates in anodizing, coloring, and sealing the aluminum material, which improves its overall quality and longevity.

Career Highlights

Cheolhee Cho is currently employed at Samsung Electronics Ltd., where he applies his expertise in materials treatment. His work at this leading technology company allows him to contribute to the development of advanced materials used in various electronic products.

Collaborations

Throughout his career, Cheolhee Cho has collaborated with notable colleagues, including Jinju Kim and Youngdeog Koh. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Cheolhee Cho's contributions to the field of aluminum surface treatment exemplify the importance of innovation in materials science. His patented methods not only enhance the quality of aluminum products but also reflect the ongoing advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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