Winchester, MA, United States of America

Chengxiang Ji

USPTO Granted Patents = 2 

 

Average Co-Inventor Count = 3.7

ph-index = 2

Forward Citations = 4(Granted Patents)


Location History:

  • Waltham, MA (US) (2014)
  • Winchester, MA (US) (2017)

Company Filing History:


Years Active: 2014-2017

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2 patents (USPTO):

Title: Innovations by Chengxiang Ji

Introduction

Chengxiang Ji is a notable inventor based in Winchester, MA, who has made significant contributions to the field of plasma technology. With a total of two patents to his name, his work focuses on improving the efficiency and effectiveness of plasma applications.

Latest Patents

One of his latest patents is the "Microwave plasma applicator with improved power uniformity." This innovative apparatus includes a plasma discharge tube and a conductive coil that is helically wound around the tube's outer surface. A waveguide is coupled to a microwave cavity surrounding the plasma discharge tube, guiding microwave energy into the tube to generate plasma. The design allows for the electric field of the microwave energy to be oriented at a predetermined angle, optimizing power absorption within the plasma discharge tube.

Another significant patent is for a method aimed at "Reduction of copper or trace metal contaminants in plasma electrolytic oxidation coatings." This method creates an oxide layer with a reduced copper concentration over aluminum and copper surfaces, which is crucial for semiconductor processing systems. The oxide layer produced through this process decreases the risk of copper contamination and enhances the erosion and corrosion resistance of the layer.

Career Highlights

Chengxiang Ji is currently employed at MKS Instruments, Inc., where he continues to develop innovative solutions in plasma technology. His work has been instrumental in advancing the applications of plasma in various industries.

Collaborations

Chengxiang has collaborated with talented coworkers, including Xing Chen and Erin Madden, contributing to a dynamic and innovative work environment.

Conclusion

Chengxiang Ji's contributions to plasma technology through his patents demonstrate his commitment to innovation and excellence in his field. His work not only enhances the efficiency of plasma applications but also addresses critical challenges in semiconductor processing.

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