Cheng-Yu Wen

Title: Cheng-Yu Wen: Innovator in Overlay Mark Technology

Introduction

Cheng-Yu Wen is a prominent inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent related to overlay marks.

Latest Patents

Cheng-Yu Wen holds a patent for an "Overlay mark and method of fabricating the same." This invention includes an apparatus featuring an overlay mark that consists of a first portion with a first pattern and a second portion with a second pattern. The first pattern is characterized by a plurality of first features and a first center feature, each separated by gaps along a specified direction. Notably, at least two gaps are identical while differing from others, and the first centers are symmetric concerning the first center feature. The second pattern mirrors this structure, with a plurality of second features and a second center feature, also separated by gaps. The alignment of the first center feature of the first pattern with the second center feature of the second pattern is achieved along a different direction. This innovative design enhances the precision and efficiency of semiconductor manufacturing processes.

Career Highlights

Cheng-Yu Wen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work focuses on advancing technologies that improve manufacturing capabilities and product quality.

Collaborations

Cheng-Yu Wen collaborates with esteemed colleagues such as Yin-Jie Wang and Hsiao-Chun Kuo. Their combined expertise contributes to the innovative environment at Taiwan Semiconductor Manufacturing Company Limited.

Conclusion

Cheng-Yu Wen's contributions to overlay mark technology exemplify the innovative spirit within the semiconductor industry. His patent not only showcases his ingenuity but also reflects the collaborative efforts of his team.