Cheng-Yi Lung

Title: Cheng-Yi Lung: Innovator in Semiconductor Manufacturing

Introduction

Cheng-Yi Lung is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patents. With a total of 2 patents, Cheng-Yi Lung continues to push the boundaries of technology in his industry.

Latest Patents

Cheng-Yi Lung's latest patents include an "Opening structure and manufacturing method thereof" and a "Method of word-line formation by semi-damascene process with thin protective conductor layer." The first patent describes a manufacturing method for an opening structure that involves forming a multi-layer structure with alternately stacked conductive layers and dielectric layers on a substrate. This method ensures that the conductive layers in different regions are appropriately structured for optimal performance. The second patent outlines a semi-damascene method for fabricating wordlines without stringers, while maintaining critical cell dimensions when the wordline pitch is less than 40 nm. This innovative approach includes a thin conducting layer that protects a storage layer during manufacture.

Career Highlights

Cheng-Yi Lung is currently employed at Macronix International Co., Ltd., where he applies his expertise in semiconductor technology. His work has been instrumental in advancing the company's capabilities in manufacturing and design.

Collaborations

Cheng-Yi Lung has collaborated with notable colleagues, including An-Chyi Wei and Ta Hung Yang. These partnerships have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Cheng-Yi Lung is a key figure in the semiconductor industry, known for his innovative patents and contributions to manufacturing processes. His work continues to influence the field and drive advancements in technology.