Cheng-Yen Wen

Title: Cheng-Yen Wen: Innovator in Semiconductor Technology

Introduction

Cheng-Yen Wen is a prominent inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding three patents that showcase his innovative approach to device design and manufacturing.

Latest Patents

One of his latest patents is titled "Nano-structure transistors with air inner spacers and methods forming same." This patent describes a method that involves forming a stack of layers, which includes a plurality of semiconductor nano structures and sacrificial layers arranged alternately. The method further includes laterally recessing the sacrificial layers to create lateral recesses, forming inner spacers in these recesses, and epitaxially growing a source/drain region from the semiconductor nano structures. Notably, the source/drain region is spaced apart from the inner spacers by air inner spacers.

Another significant patent is the "Semiconductor device and method." This invention includes a semiconductor device featuring a seeding layer in the source/drain region. The device comprises a plurality of nanostructures over a substrate, a gate structure wrapping around these nanostructures, and a source/drain region adjacent to them. The source/drain region includes a polycrystalline seeding layer covering the sidewalls of the nanostructures and inner spacers, with a semiconductor layer above the seeding layer that has a higher dopant concentration.

Career Highlights

Cheng-Yen Wen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work focuses on advancing semiconductor technologies and improving device performance through innovative designs.

Collaborations

Throughout his career, Cheng-Yen has collaborated with notable colleagues, including Li-Li Su and Yee-Chia Yeo. These collaborations have contributed to the development of cutting-edge semiconductor technologies.

Conclusion

Cheng-Yen Wen is a distinguished inventor whose work in semiconductor technology has led to significant advancements in the field. His innovative patents reflect his expertise and commitment to enhancing device performance.