Cheng Tao Chen

Title: Cheng Tao Chen: Innovator in Mask ROM Fabrication

Introduction

Cheng Tao Chen is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of mask ROM fabrication. His innovative methods have paved the way for advancements in memory technology.

Latest Patents

Cheng Tao Chen holds a patent for a mask ROM fabrication method. This method involves several steps, including the sequential formation of a gate dielectric layer and a first photoresist layer on a substrate. It utilizes light with a wavelength of 365 nm to photolithographically create a plurality of first trenches with a width of 243-365 nm. The process also includes doping the substrate to form embedded bit lines and the formation of polysilicon word lines. This innovative approach reduces the line width of mask ROM to 243-365 nm, thereby decreasing the area of mask ROM.

Career Highlights

Throughout his career, Cheng has worked with several prominent companies in the technology sector. He has been associated with Nyquest Technology Corporation Limited and Nuvoton Technology Corporation. His work in these organizations has contributed to the development of advanced semiconductor technologies.

Collaborations

Cheng has collaborated with notable professionals in his field, including Chung-Lung Hsu and Chun-Yao Chiu. These collaborations have further enhanced his contributions to the industry.

Conclusion

Cheng Tao Chen is a distinguished inventor whose work in mask ROM fabrication has significantly impacted semiconductor technology. His innovative methods and collaborations with industry professionals highlight his importance in the field.