Kaohsiung, Taiwan

Cheng-Hsiang Wang


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Cheng-Hsiang Wang: Innovator in Integrated Circuit Technology

Introduction

Cheng-Hsiang Wang is a prominent inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of integrated circuits, showcasing his expertise through innovative patents. His work is instrumental in advancing semiconductor technology.

Latest Patents

Cheng-Hsiang Wang holds a patent for an "Integrated circuit and method for manufacturing the same." This patent outlines a method for manufacturing an integrated circuit that includes depositing a floating gate electrode film over a semiconductor substrate. The process involves patterning the floating gate electrode film into at least one floating gate electrode with openings, followed by depositing a control gate electrode film to overfill these openings. Finally, the control gate electrode film is patterned into at least one control gate electrode over the floating gate electrode. This innovative approach enhances the efficiency and effectiveness of integrated circuit manufacturing.

Career Highlights

Cheng-Hsiang Wang is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His role in this esteemed company allows him to contribute to cutting-edge technology and collaborate with other talented professionals in the field.

Collaborations

Cheng-Hsiang Wang has worked alongside notable colleagues such as Chi-Chung Jen and Yu-Chu Lin. Their collaborative efforts have furthered advancements in semiconductor technology and innovation.

Conclusion

Cheng-Hsiang Wang's contributions to integrated circuit technology through his patent and work at Taiwan Semiconductor Manufacturing Company Limited highlight his importance in the field. His innovative methods continue to influence the future of semiconductor manufacturing.

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