Cheng-Hao Yang

Title: Cheng-Hao Yang: Innovator in Fin Removal Monitoring

Introduction

Cheng-Hao Yang is a notable inventor based in Changhua County, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in methods for monitoring fin removal. His innovative approach has implications for the manufacturing processes in the industry.

Latest Patents

Cheng-Hao Yang holds a patent titled "Method for Monitoring Fin Removal." This patent describes a method that includes providing a substrate with distinct regions featuring fins extending in perpendicular directions. The process involves forming a material layer over these fins and patterning them to simultaneously remove parts, resulting in distinct fin features. This method enhances the monitoring of fin features, which is crucial for precision in semiconductor fabrication.

Career Highlights

Cheng-Hao Yang is associated with United Microelectronics Corporation, a leading company in the semiconductor industry. His work there has focused on advancing technologies that improve manufacturing efficiency and product quality. His patent reflects his commitment to innovation and excellence in his field.

Collaborations

Cheng-Hao Yang has collaborated with esteemed colleagues such as En-Chiuan Liou and Hsiao-Lin Hsu. These collaborations have fostered a productive environment for innovation and have contributed to the success of their projects.

Conclusion

Cheng-Hao Yang's contributions to the field of semiconductor technology through his patent on fin removal monitoring exemplify his innovative spirit and dedication to advancing manufacturing processes. His work continues to influence the industry positively.