Cheng-Chieh Lin

Title: Innovations of Cheng-Chieh Lin in Semiconductor Technology

Introduction

Cheng-Chieh Lin is a prominent inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of dipole engineering. His innovative approaches have the potential to enhance the performance of multi-threshold voltage applications in stacked device structures.

Latest Patents

Cheng-Chieh Lin holds a patent titled "Incorporating nitrogen in dipole engineering for multi-threshold voltage applications in stacked device structures." This patent discloses dipole engineering techniques that incorporate dipole dopant and/or nitrogen into gate dielectrics, such as high-k dielectric layers, to achieve multi-threshold voltage transistor tuning. The techniques include forming a dipole dopant source layer over gate dielectrics of some transistors, forming a mask over gate dielectrics of other transistors, performing a nitrogen-containing thermal drive-in process, and subsequently removing the dipole dopant source layer and the mask. This process allows for the diffusion of nitrogen and dipole dopants into the gate dielectrics, enhancing the functionality of the transistors.

Career Highlights

Cheng-Chieh Lin is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work focuses on advancing technologies that improve the efficiency and performance of semiconductor devices. His innovative contributions have positioned him as a key figure in the field.

Collaborations

Cheng-Chieh Lin collaborates with talented coworkers such as Pei Ying Lai and Hsueh-Ju Chen. Their combined expertise fosters a creative environment that drives innovation in semiconductor technology.

Conclusion

Cheng-Chieh Lin's work in dipole engineering represents a significant advancement in semiconductor technology. His patent and contributions to Taiwan Semiconductor Manufacturing Company Limited highlight his role as an influential inventor in the industry.