Cheng-Chang Lee

Title: Innovations of Cheng-Chang Lee

Introduction

Cheng-Chang Lee is a notable inventor based in Taoyuan Hsien, Taiwan. He has made significant contributions to the field of micro-electromechanical systems, holding a total of 3 patents. His work focuses on innovative devices and manufacturing methods that enhance technological capabilities.

Latest Patents

One of his latest patents is a micro-electromechanical device and manufacturing method thereof. This device includes a substrate, a first patterned conductive layer, a second patterned conductive layer, and a first patterned blocking layer. The first patterned conductive layer is disposed on the substrate, while the second patterned conductive layer is placed on the first. The first patterned blocking layer connects with both the first and second patterned conductive layers. Additionally, a method of manufacturing this micro-electromechanical device is disclosed. Another significant patent is a capacitance sensing structure, which comprises a substrate, a sensing electrode layer, at least one stack layer, and a conductive body. The sensing electrode layer is formed on or within the substrate, and the stack layer is positioned on the sensing electrode layer. The conductive body is placed over and corresponds to both the sensing electrode layer and the stack layer.

Career Highlights

Cheng-Chang Lee is currently employed at Delta Electronics, Inc., where he continues to innovate and develop new technologies. His work has been instrumental in advancing the capabilities of micro-electromechanical systems.

Collaborations

He has collaborated with notable coworkers, including Hsieh-Shen Hsieh and Chao-Jui Liang, contributing to various projects and innovations in the field.

Conclusion

Cheng-Chang Lee's contributions to micro-electromechanical systems through his patents and collaborations highlight his role as a significant inventor in the technology sector. His work continues to influence advancements in this field.