Delta Electronics, Inc.

Cheng-Chang Lee

Huang-Kun Chen

Tai-Kang Shing

Hsieh-Shen Hsieh

Chao-Jui Liang

Horng-Jou Wang

Zong-Ting Yuan

Heng-Chung Chang

Chao-Qing Wang

A micro-electromechanical device includes a substrate, a first patterned conductive layer, a second patterned conductive layer and a first patterned blocking layer. The first patterned conductive layer is disposed on the substrate. The second patterned conductive layer is disposed on the first patterned conductive layer. The first patterned blocking layer is connected with the first patterned conductive layer and the second patterned conductive layer. In addition, a method of manufacturing the micro-electromechanical device is also disclosed.

Micro-electromechanical device and manufacturing method thereof

A capacitance sensing structure includes a substrate, a sensing electrode layer, at least one stack layer and a conductive body. The sensing electrode layer is formed on or in the substrate. The stack layer is formed on the sensing electrode layer. The conductive body is disposed over and corresponding to the sensing electrode layer and the stack layer.

Capacitance sensing structure

A semiconductor piezoresistive sensor, which is electrically connected with a circuit, includes a semiconductor base, at least one piezoresistive element and a conductive layer. The semiconductor base includes a diaphragm and a base. The base is disposed adjacent to and around the diaphragm. The piezoresistive element is formed in the diaphragm and is electrically connected with the circuit. The conductive layer is electrically connected with the diaphragm.

Semiconductor piezoresistive sensor and operation method thereof

Growing community of inventors

Taoyuan Hsien, Taiwan

Cheng-Chang Lee