Mayfield Heights, OH, United States of America

Chen Wang

This inventor holds 1 USPTO granted patent. Top assignee: Materion Gmbh. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chen Wang. Retrieved from https://idiyas.com/inventor/chen-wang-6410pz3v

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovations of Chen Wang

Introduction

Chen Wang is an accomplished inventor based in Mayfield Heights, OH (US). He has made significant contributions to the field of materials science, particularly in the area of sputtering technology. His innovative work has led to the development of a unique patent that enhances the efficiency and effectiveness of sputtering targets.

Latest Patents

One of Chen Wang's notable patents is titled "Modular sputtering target with precious metal insert and skirt." This invention comprises a target insert made of a target metal compound and a skirt structure that includes both a primary skirt and a secondary skirt. The primary skirt is positioned adjacent to at least a portion of the secondary skirt and is made from a first metal compound. The secondary skirt, on the other hand, consists of a second metal compound that differs from the first. This innovative design allows for improved performance in sputtering applications.

Career Highlights

Chen Wang is currently employed at Materion GmbH, where he continues to push the boundaries of technology and innovation. His work at the company has been instrumental in advancing the capabilities of sputtering targets, making them more efficient and effective for various applications.

Collaborations

Throughout his career, Chen has collaborated with talented individuals such as Matthew Fisher and James Guerrero. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

In summary, Chen Wang is a prominent inventor whose work in sputtering technology has led to significant advancements in the field. His patent for a modular sputtering target showcases his innovative spirit and dedication to improving materials science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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