The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 2025
Filed:
Jun. 24, 2022
Applicant:
Materion Corporation, Mayfield Heights, OH (US);
Inventors:
Matthew Fisher, Mayfield Heights, OH (US);
James Guerrero, Mayfield Heights, OH (US);
Chen Wang, Mayfield Heights, OH (US);
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2006.01); C23C 14/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3407 (2013.01); C23C 14/3414 (2013.01); H01J 37/3417 (2013.01); H01J 37/3423 (2013.01); H01J 37/3426 (2013.01); H01J 37/3429 (2013.01); H01J 37/3435 (2013.01);
Abstract
A sputtering target comprising a target insert comprising a target metal compound and a skirt structure including a primary skirt and a secondary skirt. The primary skirt is disposed adjacent least a portion of a secondary skirt and comprises a first metal compound. The secondary skirt comprises a second metal compound that is different from the first metal compound.