This inventor holds 3 USPTO granted patents and 1 published patent application. Top assignee: Hitachi High-Tech Corporation. Active years: 2024-2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024-2025
Title: Chen Pin Hsu: Innovator in Vacuum and Plasma Processing Technologies
Introduction
Chen Pin Hsu is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of vacuum and plasma processing technologies. With a total of 3 patents to his name, Hsu has demonstrated a commitment to advancing technological solutions in his area of expertise.
Latest Patents
Hsu's latest patents include a vacuum processing apparatus and a plasma processing apparatus. The vacuum processing apparatus features a vacuum processing unit that encompasses a vacuum vessel for wafer processing, a lock chamber for wafer transfer, and an atmospheric transfer unit. This innovative design also includes a wafer preserving container equipped with an exhaust port to manage gas in the stacking space. The plasma processing apparatus is designed to control plasma density distribution, addressing issues related to in-plane uniformity and charge-up damage. It consists of a vacuum chamber with a plasma processing chamber and a microwave power supply unit that utilizes a circular waveguide to deliver microwave power.
Career Highlights
Chen Pin Hsu is currently employed at Hitachi High-Tech Corporation, where he continues to develop cutting-edge technologies. His work has been instrumental in enhancing the efficiency and effectiveness of processing equipment used in various applications.
Collaborations
Hsu collaborates with esteemed colleagues such as Hitoshi Tamura and Masatsugu Fujita. Their combined expertise fosters an environment of innovation and progress within their projects.
Conclusion
In summary, Chen Pin Hsu is a distinguished inventor whose work in vacuum and plasma processing technologies has made a significant impact. His patents reflect his innovative spirit and dedication to advancing the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
